Search Product
Structure Search
Search
Advantage Products
Location: Industrial Info
CAS:15599-91-4| The Application of Hexafluorocyclophosphazene in Electronic Substrates
Product Name:Hexafluorocyclophosphazene
CAS:15599-91-4
Molecular Formula:F6N3P3
Article No.:L0784
Structural Formula:
Product Introduction
Hexafluorocyclophosphazene is a white to light yellow crystal mainly used as a flame retardant in lithium battery electrolytes, and can also be used in fields such as lubricants, semiconductors, or liquid crystal display substrates.
Application of Hexafluorocyclotriphosphazene
In the manufacturing steps of electronic components such as semiconductor devices or liquid crystal display devices, various wet treatments using liquids are applied to the substrate, and then the substrate is dried to remove the liquid attached to the substrate due to wet treatment. Wet treatment refers to the cleaning process of removing pollutants from the surface of the substrate. Through the dry etching step, there are etching residues, metal impurities, or organic pollutants on the surface of the substrate with concave convex micro patterns. In order to remove these substances, the substrate needs to be treated with cleaning solution. After cleaning, drying treatment is also required. As the pattern formed on the substrate becomes finer, the aspect ratio of the convex parts with concave convex patterns increases. Therefore, there is a problem of pattern collapse during drying treatment. Therefore, the CN110800087B patent provides a substrate processing method, substrate processing liquid, and substrate processing device. The substrate treatment solution should at least contain sublimating substances (drying auxiliary substances) in a melted state and solvents:
Sublimating substances can include hexamethylenetetramine, 1,3,5-trioxane, 1-pyrrolidine dithiocarboxylate ammonium, tetraacetaldehyde, alkanes (CnH2n+2 (n:20-48)), tert butanol, p-dichlorobenzene, naphthalene, L-menthol, fluorinated carbon compounds, etc.
Among them, fluorinated carbon compounds can be fluorocyclophosphazene, specifically hexafluorocyclophosphazene, octafluorocyclophosphazene, decafluorocyclophosphazene, dodecafluorocyclophosphazene, etc.
The substrate treatment solution of the present invention patent includes sublimation substances and solvents in a molten state. The solidification point of sublimation substances is higher than that of the substrate treatment solution. Therefore, in the case of reducing the solubility of sublimation substances in the solvent, sublimation substances with a density higher than that of the substrate treatment solution will precipitate due to excessive amounts. Therefore, the substrate treatment solution of the present invention can reduce the use of sublimating substances and reduce the risk of pattern collapse.
References
CN110800087B Substrate processing method, substrate processing liquid, and substrate processing device.